题目：原子层沉积技术及其在光电转换器件的应用

报告人：李湘林 副教授 湖南第一师范学院

报告时间：2026年7月20日（周一）上午10:00

报告地点：超硬实验综合楼5楼A514会议室

摘要：Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in solar energy research has received increasing attention in recent years. The research focus of our work is focused on the fabrication, surface passivation of nanostructured photoelectrodes based on ALD technique. Various of “host & guest” type composite photoanodes have been designed and fabricated for efficient photoelectrochemical (PEC) water splitting based on ALD. In such a design, a highly porous and conductive nanostructures act as the “host” skeleton it provides direct pathways for faster electron transport, while the conformally coated semiconductor layers act as the “guest” absorber layer. For example, a 3D FTO/FTO-NR/TiO₂ composite invers opal structure, Nb doped SnO₂ nanosheet/TiO₂ and Nb doped SnO₂ nanosheet/Fe₂O₃ heterostructures were designed for PEC water splitting application. Also the ALD thin layer surface passivation and ALD ZnSnO, Zn(O, S) Cd-free buffer layers for CIGS/CZTS solar cells were studied. Challenges and future directions of ALD in the applications of solar conversion will be discussed.

In this talk, I will also introduce the development history and product advantages of Dongguan Nanofrontier (东莞纳锋) and Hunan Tenano（湖南拾纳）companies.

报告人简介：李湘林，博士毕业于新加坡南洋理工大学。从事原子层沉积技术研究(Atomic Layer Deposition, ALD）二十余年，包括ALD 基本原理、ALD 装备技术、ALD技术应用拓展等研究；主要研究方向包括能源材料与物理、薄膜太阳能电池研究、储能材料及器件研究；发表SCI学术论文50余篇，专利10余项；东莞纳锋微电子装备有限公司&湖南拾纳新能源科技有限公司创始人，东莞纳锋2021年获评高新技术企业，湖南拾纳2025年获评高新技术企业；团队所研发的ALD系统已成功交付至南洋理工大学、北京大学、中山大学、上海交通大学、同济大学、南开大学、湖南大学、华南理工大学、宁德时代、旗滨科技等知名高校与企业，获得诸多知名教授及专家的高度认可。

主办单位：吉林大学高压与超硬材料全国重点实验室

吉林大学综合极端条件高压科学中心

吉林大学物理学院

吉林省物理学会

中国物理学会高压物理专业委员会